How are photolithographic masks made in integrated circuit fabrication? For a 400GB flash memory chip, 3,200,000,000,000 repeating patterns are needed in the mask to etch out the circuitry for each bit of
Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect
![A novel hardmask-to-substrate pattern transfer method for creating 3D, multi-level, hierarchical, high aspect-ratio structures for applications in microfluidics and cooling technologies | Scientific Reports A novel hardmask-to-substrate pattern transfer method for creating 3D, multi-level, hierarchical, high aspect-ratio structures for applications in microfluidics and cooling technologies | Scientific Reports](https://media.springernature.com/full/springer-static/image/art%3A10.1038%2Fs41598-022-16281-5/MediaObjects/41598_2022_16281_Fig1_HTML.png)